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Figliolini, Alexander; Archuletta, Michael; LeClaire, Jeff; Brinkley, David; Doerr, David; White, Roy; Bozak, Ron; Lee, David A.; Behringer, Uwe F.W.; Maurer, Wilhelm . (2012). SPIE Proceedings [SPIE 28th European Mask and Lithography Conference (EMLC 2012) - Dresden, Germany (Tuesday 17 January 2012)] 28th European Mask and Lithography Conference - <title>Through pellicle management of haze formation in a wafer fabrication environment</title>. , 8352(), 83520R–83520R-19. doi:10.1117/12.918378 
An interview with Sci-Hub Founder Alexandra Elbakyan,Who exactly should pay for academic research